He led YC Chem to become one of the first-generation companies in South Korea to localize materials, components, and equipment production.
He was born on December 25, 1943.
He graduated from the Department of Chemical Engineering at Yeungnam University.
After working for 15 years at Dongnam Synthetic Chemical Industry, he founded Young Chang Chemical, now known as YC Chem, in 1981.
In 2009, he achieved a domestic first by commercializing a negative-type photoresist (PR) for i-line (365 nm) light sources. He also successfully localized PR for through-silicon via (TSV) technology used in high-bandwidth memory (HBM), a next-generation DRAM.